{"id":65732,"date":"2026-06-30T11:28:19","date_gmt":"2026-06-30T18:28:19","guid":{"rendered":"https:\/\/silvaco-stage.betagentechnologies.com\/uncategorized\/tcad-breakdown-simulation-of-a-1200-v-vertical-gan-finfet\/"},"modified":"2026-07-01T10:58:26","modified_gmt":"2026-07-01T17:58:26","slug":"tcad-breakdown-simulation-of-a-1200-v-vertical-gan-finfet","status":"publish","type":"post","link":"https:\/\/silvaco-stage.betagentechnologies.com\/ja\/tcad-breakdown-simulation-of-a-1200-v-vertical-gan-finfet\/","title":{"rendered":"TCAD Breakdown Simulation of a 1200 V Vertical GaN FinFET"},"content":{"rendered":"<h1><b>TCAD Breakdown Simulation of a 1200 V Vertical GaN FinFET<\/b><\/h1>\n<p class=\"p1\"><i>Khaled Ahmeda, Nereus Agbo &amp; Xiang Li<br \/>\n<\/i><i>Research and Development Centre, Dynex Semiconductor Ltd, Doddington Rd, Lincoln LN6 3LF, United Kingdom<\/i><\/p>\n<h3 class=\"p1\"><span class=\"s1\">Abstract<\/span><\/h3>\n<p class=\"p1\"><span class=\"s1\"><img fetchpriority=\"high\" decoding=\"async\" class=\"wp-image-65719 alignright\" src=\"https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/2026\/06\/SS_Q3_JUN2026_image-1.png\" alt=\"\" width=\"290\" height=\"198\" srcset=\"https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/2026\/06\/SS_Q3_JUN2026_image-1.png 400w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/2026\/06\/SS_Q3_JUN2026_image-1-300x205.png 300w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/2026\/06\/SS_Q3_JUN2026_image-1-43x29.png 43w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/2026\/06\/SS_Q3_JUN2026_image-1-63x43.png 63w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/2026\/06\/SS_Q3_JUN2026_image-1-48x33.png 48w\" sizes=\"(max-width: 290px) 100vw, 290px\" \/>This paper presents TCAD process, mesh, and device simulations of a 1200 V vertical gallium nitride (GaN) FinFET using Silvaco Victory tools. The simulated structure is based on a previously reported vertical GaN FinFET fabricated on bulk GaN substrates, comprising an n<sup>+<\/sup> GaN cap, a lightly <\/span>doped drift region, and an Al2O3 gate dielectric. The pro<span class=\"s1\">cess flow is reproduced in Victory Process, followed b<\/span>y mesh generation in Victory Mesh and electrical simulatio<span class=\"s1\">n <\/span>in Victory Device using physical models that include Shockley<span class=\"s1\">\u2013Read\u2013Hall recombination, Auger recombination, band-to-band tunnelling, Schottky tunnelling, self-heating, and impact ionization. The simulation reproduces breakdown behaviour at approximately 1200 V, with low drain and gate leakage currents. Analysis of the electric field, impact generation rate, and current density indicates that breakdown is governed by electric-field crowding at the bottom of the fin. These results demonstrate the capability of TCAD simulation to capture the breakdown behavior of vertical GaN FinFETs and provide insight into the critical regions that determine high-voltage performance.<\/span><\/p>\n<p><img loading=\"lazy\" width=\"300\" height=\"392\" src=\"https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/2026\/06\/SS_Q3_JUN2026.jpg\" class=\"cleaned-enfold-image\" alt=\"\" decoding=\"async\" loading=\"lazy\" srcset=\"https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/2026\/06\/SS_Q3_JUN2026.jpg 300w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/2026\/06\/SS_Q3_JUN2026-230x300.jpg 230w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/2026\/06\/SS_Q3_JUN2026-28x37.jpg 28w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/2026\/06\/SS_Q3_JUN2026-42x55.jpg 42w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/2026\/06\/SS_Q3_JUN2026-37x48.jpg 37w\" sizes=\"auto, (max-width: 300px) 100vw, 300px\" \/><\/p>\n","protected":false},"excerpt":{"rendered":"<p>This paper presents TCAD process, mesh, and device simulations of a 1200 V vertical gallium nitride (GaN) FinFET using Silvaco Victory tools<\/p>\n","protected":false},"author":8,"featured_media":65675,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[7570],"tags":[],"class_list":["post-65732","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-simulation-standard","entry","has-media"],"_links":{"self":[{"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ja\/wp-json\/wp\/v2\/posts\/65732","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ja\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ja\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ja\/wp-json\/wp\/v2\/users\/8"}],"replies":[{"embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ja\/wp-json\/wp\/v2\/comments?post=65732"}],"version-history":[{"count":3,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ja\/wp-json\/wp\/v2\/posts\/65732\/revisions"}],"predecessor-version":[{"id":65741,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ja\/wp-json\/wp\/v2\/posts\/65732\/revisions\/65741"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ja\/wp-json\/wp\/v2\/media\/65675"}],"wp:attachment":[{"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ja\/wp-json\/wp\/v2\/media?parent=65732"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ja\/wp-json\/wp\/v2\/categories?post=65732"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ja\/wp-json\/wp\/v2\/tags?post=65732"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}