{"id":30655,"date":"2020-07-31T04:51:53","date_gmt":"2020-07-31T04:51:53","guid":{"rendered":"https:\/\/silvaco-stage.betagentechnologies.com\/%eb%b6%84%eb%a5%98%eb%90%98%ec%a7%80-%ec%95%8a%ec%9d%8c\/2020-tcad-baseline-release-section-1-process-simulation-new-features-in-2020-baseline-release\/"},"modified":"2021-07-16T21:32:10","modified_gmt":"2021-07-17T04:32:10","slug":"2020-tcad-baseline-release-section-1-process-simulation-new-features-in-2020-baseline-release","status":"publish","type":"post","link":"https:\/\/silvaco-stage.betagentechnologies.com\/ko\/2020-tcad-baseline-release-section-1-process-simulation-new-features-in-2020-baseline-release\/","title":{"rendered":"2020 TCAD Baseline Release Section 1: Process Simulation \u2013 New Features in 2020 Baseline Release"},"content":{"rendered":"<h1>2020 TCAD Baseline Release<br \/>\nSection 1: Process Simulation \u2013 New Features in 2020 Baseline Release<\/h1>\n<p>2020 baseline release of Victory Process includes improvements and extensions to the following modules:<\/p>\n<ul>\n<li>Implantation<\/li>\n<li>Etching\/deposition<\/li>\n<li>Stress simulation<\/li>\n<li>Annealing\/oxidation<\/li>\n<\/ul>\n<p>Usability of setting material parameters via input deck was also improved.<\/p>\n<p><strong>1.1\u00a0 \u00a0 \u00a0Crystal Dependent Model for Physical Etching\/Deposition<\/strong><br \/>\n1.1.1\u00a0 \u00a0 KOH Etching Simulation<br \/>\n1.2\u00a0 \u00a0 1.2 Advances in Mask Handling<br \/>\n1.2.1 Multiple Stripes in Inline Mask<br \/>\n1.2.2 Defining Rectangular Mask<br \/>\n1.2.3 Parameter PITCH for Defining Array of Polygons<br \/>\n1.2.4 Saving Active Layout to GDS File<br \/>\n1.2.5 Changes in .map File Processing<br \/>\n1.3\u00a0 \u00a0 \u00a0New Features in Diffusion<br \/>\n1.3.1\u00a0 Pt_diffusion in Silicon<br \/>\n1.3.2 H Diffusion in IGZO<br \/>\n1.4\u00a0 \u00a0 \u00a0Miscellaneous Usability Changes<br \/>\n1.5 Stress Module<br \/>\n1.5.1 Bending Over Cylinder<br \/>\n1.5.2 Numerical Controls for Stress Module<br \/>\n1.6 Oxidation<br \/>\n1.7 Changes in Parameter Settings via Deck<\/p>\n<p>Following are details and examples of usage of the major improvements.<\/p>\n<h3>1.1 Crystal Dependent Model for Physical Etching\/Deposition<\/h3>\n<p>The new physical model was developed for physicalbase etch\/depo module:<\/p>\n<p style=\"padding-left: 40px;\">Crystal dependent model<\/p>\n<p>This model simulates the processes when etching\/deposition rates strongly depend on local crystal plane orientation [1][2]. Examples of those technological processes are:<\/p>\n<ul>\n<li>Wet etching of silicon (e.g. with KOH)<\/li>\n<li>SiGe crystal growth of source drain regions in FinFet or planar technology<\/li>\n<\/ul>\n<p><img loading=\"lazy\" width=\"567\" height=\"725\" src=\"https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_Q2_2020_a1.jpg\" class=\"cleaned-enfold-image\" alt=\"\" decoding=\"async\" loading=\"lazy\" srcset=\"https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_Q2_2020_a1.jpg 567w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_Q2_2020_a1-235x300.jpg 235w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_Q2_2020_a1-551x705.jpg 551w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_Q2_2020_a1-29x37.jpg 29w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_Q2_2020_a1-43x55.jpg 43w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_Q2_2020_a1-38x48.jpg 38w\" sizes=\"auto, (max-width: 567px) 100vw, 567px\" \/><\/p>\n","protected":false},"excerpt":{"rendered":"<p>2020 TCAD Baseline Release<br \/>\nSection 1: Process Simulation \u2013 New Features in 2020 Baseline Release<\/p>\n","protected":false},"author":3,"featured_media":22473,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[7486],"tags":[],"class_list":["post-30655","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-simulation-standard-ko","entry","has-media"],"_links":{"self":[{"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ko\/wp-json\/wp\/v2\/posts\/30655","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ko\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ko\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ko\/wp-json\/wp\/v2\/users\/3"}],"replies":[{"embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ko\/wp-json\/wp\/v2\/comments?post=30655"}],"version-history":[{"count":1,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ko\/wp-json\/wp\/v2\/posts\/30655\/revisions"}],"predecessor-version":[{"id":30660,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ko\/wp-json\/wp\/v2\/posts\/30655\/revisions\/30660"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ko\/wp-json\/wp\/v2\/media\/22473"}],"wp:attachment":[{"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ko\/wp-json\/wp\/v2\/media?parent=30655"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ko\/wp-json\/wp\/v2\/categories?post=30655"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/ko\/wp-json\/wp\/v2\/tags?post=30655"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}