{"id":36169,"date":"2016-04-28T16:17:25","date_gmt":"2016-04-28T16:17:25","guid":{"rendered":"https:\/\/silvaco-stage.betagentechnologies.com\/%e6%9c%aa%e5%88%86%e7%b1%bb\/simulation-of-physical-etching-in-memory-technology\/"},"modified":"2021-10-13T09:57:16","modified_gmt":"2021-10-13T16:57:16","slug":"simulation-of-physical-etching-in-memory-technology","status":"publish","type":"post","link":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/simulation-of-physical-etching-in-memory-technology\/","title":{"rendered":"Simulation of Physical Etching in Memory Technology"},"content":{"rendered":"

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Simulation of Physical Etching in Memory Technology<\/h1>\n

This webinar will provide a deep insight into the methods, mechanisms and models to simulate physical etching with a special focus on memory technology. We will look into the simulation of very high aspect ratio narrow trench etching, which is among the key challenges in vertical non-volatile memory applications. The architecture and the modeling environment of Silvaco’s multi-dimensional process simulation tool Victory Process which embeds the physical etching capabilities will be demonstrated in detail. We will also show the flexibility of the open modeling system offered by Victory Process for adding new modeling features, which allows the engineer to optimally balance between the physical accuracy of a simulation and the simulation time requirements. On top of that, the fundamental properties of the ion enhanced chemical etching model which enables the simulation of high aspect ratio etching will be explained and analyzed and applications of it will be shown.<\/p>\n

What attendees will learn:<\/h2>\n