{"id":36729,"date":"2003-02-01T19:23:56","date_gmt":"2003-02-01T19:23:56","guid":{"rendered":"https:\/\/silvaco-stage.betagentechnologies.com\/%e6%9c%aa%e5%88%86%e7%b1%bb\/optical-lithography-models-in-athena\/"},"modified":"2021-10-13T10:43:24","modified_gmt":"2021-10-13T17:43:24","slug":"optical-lithography-models-in-athena","status":"publish","type":"post","link":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/optical-lithography-models-in-athena\/","title":{"rendered":"Optical Lithography Models in ATHENA"},"content":{"rendered":"<h1>Optical Lithography Models in ATHENA<\/h1>\n<h3>Introduction<\/h3>\n<p>ATHENA\u2019s Optolith module is designed to simulate the 3 basic lithography technologies; contact printing, proximity and projection lithography. The imaging calculations within Optolith are flexible enough to handle all three situations. Optolith is based upon a solution of the Helmholtz equation for media with complex refractive indices and the Beam Propogation Method [1]. This allows Optolith to take account of both diffraction effects and any non-linear local optical properties of the resist material.<\/p>\n<p><img loading=\"lazy\" width=\"1286\" height=\"1669\" src=\"https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_feb_2003_hints.jpg\" class=\"cleaned-enfold-image\" alt=\"\" decoding=\"async\" loading=\"lazy\" srcset=\"https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_feb_2003_hints.jpg 1286w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_feb_2003_hints-231x300.jpg 231w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_feb_2003_hints-794x1030.jpg 794w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_feb_2003_hints-768x997.jpg 768w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_feb_2003_hints-1184x1536.jpg 1184w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_feb_2003_hints-1156x1500.jpg 1156w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_feb_2003_hints-543x705.jpg 543w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_feb_2003_hints-29x37.jpg 29w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_feb_2003_hints-42x55.jpg 42w, https:\/\/silvaco-stage.betagentechnologies.com\/wp-content\/uploads\/simulationstandard\/simstd_feb_2003_hints-37x48.jpg 37w\" sizes=\"auto, (max-width: 1286px) 100vw, 1286px\" \/><\/p>\n","protected":false},"excerpt":{"rendered":"<p>ATHENA\u2019s Optolith module is designed to simulate the 3 basic lithography technologies; contact printing, proximity and projection lithography. The imaging calculations within Optolith are flexible enough to handle all three situations. Optolith is based upon a solution of the Helmholtz equation for media with complex refractive indices and the Beam Propogation Method [1]. This allows Optolith to take account of both diffraction effects and any non-linear local optical properties of the resist material.<\/p>\n","protected":false},"author":2,"featured_media":21772,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[7723],"tags":[],"class_list":["post-36729","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-simulation-standard-zh-hans","entry","has-media"],"_links":{"self":[{"href":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/wp-json\/wp\/v2\/posts\/36729","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/wp-json\/wp\/v2\/comments?post=36729"}],"version-history":[{"count":1,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/wp-json\/wp\/v2\/posts\/36729\/revisions"}],"predecessor-version":[{"id":36734,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/wp-json\/wp\/v2\/posts\/36729\/revisions\/36734"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/wp-json\/wp\/v2\/media\/21772"}],"wp:attachment":[{"href":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/wp-json\/wp\/v2\/media?parent=36729"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/wp-json\/wp\/v2\/categories?post=36729"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/silvaco-stage.betagentechnologies.com\/zh-hans\/wp-json\/wp\/v2\/tags?post=36729"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}